Research Topic

Rise of the 4th industrial revolution has brought about much interest in the semiconductor industry. With the ever-growing demand for smaller electronic devices, the need for smaller, more efficient patterning techniques continues to grow likewise. Miniaturization of patterns became accessible with development of lithography. Nowadays, extreme ultraviolet (EUV) lithography allows manufacturing of sub-5nm line and space patterns but involves tremendous amount of cost. Block copolymer lithography is cost-effective alternative patterning technique with high potential to improve the semiconductor industry. The ability of block copolymers to assemble into sub-10 nm, three-dimensional nano-patterns provides all sorts of new possibilities in the patterning field. Our group strives to realize the potential of block copolymers and effectively integrate them to everyday electronics. To be used in the semiconductor industry, our group has been recently focused on developing methods for fabrication of sub-10 nm nano-patterns with perpendicular orientation with respect to the substrate.